Deposition or cleaning apparatus with movable structure

ABSTRACT

A deposition or cleaning apparatus including an outer vacuum chamber and a reaction chamber inside the outer chamber forming a double chamber structure. The reaction chamber is configured to move between a processing position and a lowered position inside the outer vacuum chamber, the lowered position being for loading one or more substrates into the reaction chamber

FIELD

The aspects of the disclosed embodiments generally relate to depositionor cleaning apparatuses and their methods of operation. Moreparticularly, but not exclusively, the aspects of the disclosedembodiments relate to substrate processing reactors with movablestructures.

BACKGROUND

This section illustrates useful background information without admissionof any technique described herein representative of the state of theart.

In conventional deposition or cleaning processes substrates, e.g.,wafers, are moved inside vacuum clusters structures. These structuresshould give minimum or preferably no added particles on the substrates.Any mechanical or moving part above the substrate is a potentialparticle source which may affect deposition quality. For someapplications and dimensions the moving parts in the prior art can nolonger provide an acceptable solution.

U.S. Pat. No. 9,095,869 B2 discloses a deposition reactor structurecomprising a substrate transfer chamber in between a plasma source and areaction chamber. The transfer chamber comprises a moving in-feed partfor reactive chemical on the top side of the reaction chamber. Thein-feed part is vertically deformable having a contracted shape and anextended shape. The contracted shape allows loading of substrates intothe reaction chamber via a route formed by contracting the in-feed part.

SUMMARY

It is an object of embodiments of the present disclosure to provide animproved method and apparatus with regard to loading and unloading ofsubstrates and to minimize or avoid the problem caused by particlegeneration.

According to a first example aspect of the present disclosure there isprovided a deposition or cleaning apparatus, comprising:

an outer chamber;

a reaction chamber inside the outer chamber forming a double chamberstructure, wherein the reaction chamber is configured to move between aprocessing position and a lowered position inside the outer chamber, thelowered position being for loading one or more substrates into thereaction chamber.

Contrary to prior art in which the reaction chamber is stationary andother structures are moved, the embodiments of the invention providemovement of the reaction chamber itself. The reaction chamber is movablein vertical direction, or at least partially in a vertical direction.The reaction chamber being movable includes also a sidewall of thereaction chamber being movable. In certain example embodiments, themovable reaction chamber is a monolithic structure. In certain exampleembodiments, the reaction chamber forms an integral whole. In certainexample embodiments, the movement of the reaction chamber is actuatedfrom below (of the reaction chamber).

In certain example embodiments, the moving parts of the reaction chamberare positioned under the substrate (i.e., not above). In certain exampleembodiments, the reaction chamber as a whole is configured to move. Incertain example embodiments, the side wall of the reaction chamber isconfigured to move together with the rest of the reaction chamber. Incertain example embodiments, the distance between a reaction chamberbottom and reaction chamber side wall is constant while moving. Incertain example embodiments, the outer chamber does not move, i.e., theouter chamber is stationary.

The processing position may be a deposition position and/or a cleaningposition.

In certain example embodiments, the apparatus is configured to form aloading opening into the reaction chamber by downward movement of thereaction chamber.

In certain example embodiments, the reaction chamber is configured todetach from an upper stationary part (i.e., a stationary part upper tothe moving reaction chamber) upon downward movement of the reactionchamber to open a route for loading. In certain example embodiments, theupper stationary part is a part providing fluid in-feed into thereaction chamber.

The part on top of the movable reaction chamber (i.e., upper stationarypart of the apparatus) may be an open or closed part. It may be a widetube, for example, a radical in-feed part extending from a radicalsource. Or, it may be, for example, a lid-like part optionallycomprising an expansion volume for downward fluid distribution.

In certain example embodiments, the reaction chamber forms a body withrotational symmetry. The reaction chamber may be a bowl-like part(having an exhaust opening in its bottom).

In certain example embodiments, the apparatus comprises:

a loading port at the side of the outer chamber for loading the one ormore substrates into the reaction chamber through the side of the outerchamber. In certain example embodiments, the loading port is a loadlock. In certain example embodiments, the loading port is a gate valveor a hatch.

In certain example embodiments, the apparatus comprises:

a moving element configured to allow vertical movement of the reactionchamber. In certain example embodiments, the moving element is connectedto the reaction chamber. The moving element may be a flexure structure.The moving element may be a gastight structure.

In certain example embodiments, the moving element forms part of anexhaust line of the apparatus. The exhaust line may be a foreline. Incertain example embodiments, the reaction chamber comprises an exhaustline opening in the bottom of the reaction chamber. In certain exampleembodiments, the reaction chamber comprises an exhaust line openingsymmetrically in the center of the bottom of the reaction chamber. Incertain example embodiments, the moving element is placed symmetricallybelow the bottom of the reaction chamber. In certain exampleembodiments, the moving element is placed, when viewed in a lateraldirection, at the center below the bottom of the reaction chamber.

In certain example embodiments, the moving element is a tube-likeelongated structure whose length is adjustable. Accordingly, in certainexample embodiments, the moving element is a hollow deformable element.In certain example embodiments, it allows fluid to pass through it in avertical direction, but has gastight sidewalls.

In certain example embodiments, the moving element is a bellows. Incertain example embodiments, the moving element is a vacuum bellows. Incertain example embodiments, the moving element (vacuum bellows orsimilar) is in vacuum in its entirety.

In certain example embodiments, the moving element is implemented by two(or more) interlaced or nested tubes which are vertically movable inrelation to each other.

In certain example embodiments, the apparatus comprises an actuatingelement actuating the vertical movement of the reaction chamber. Theactuation may occur by applying force to the reaction chamber so thatthe reaction chamber moves as allowed by the moving element. Theplacement of the actuating element depends on the implementation. Incertain example embodiments, the actuating element is positioned on theoutside of the outer chamber. In certain example embodiments, theactuating element is positioned within the outer chamber, but on theoutside of the reaction chamber. In certain example embodiments, theactuating element is positioned within the exhaust line. In certainexample embodiment, the actuating element is omitted. In one such anembodiment, the moving element as such moves the reaction chamberwithout an external actuator (external here meaning external to themoving element). The moving may be implemented due to radiation orchanges in temperature, for example. In an example embodiment, themoving element is formed of shape-memory alloy (smart metal) the movingelement thereby being an actuator in itself.

In certain example embodiments, the apparatus comprises a substrateholder. The substrate holder may support the substrate, for example, awafer in a horizontal orientation. In certain example embodiments, thesubstrate is a 450 mm diameter wafer. In other embodiments, thesubstrate is a wafer whose diameter is smaller than 450 mm, for example300 mm. A deposition or cleaning process may be carried out onhorizontally oriented substrate(s). Alternatively, the substrateorientation is vertical. The substrate holder may support one verticallyoriented substrate or a plurality of vertically oriented substrates.Depending on the implementation, the substrates may be oriented eitherhorizontally or vertically when loading them. The substrates may beloaded one at a time or as a batch.

In certain example embodiments, the substrate holder is attached to theexhaust line. In certain example embodiments, the substrate holder isintegratable or integrated to reaction chamber top part of lid. Thesubstrate holder may be movable, for example, vertically. It may beheated and/or otherwise electrically adjustable. In certain otherembodiments, the apparatus is implemented without a substrate holder. Insuch an embodiment, the substrate may be supported by reaction chamberwall(s) and/or by an upper edge of an optional protective element whichis placed within the exhaust line and which is configured to preventmaterial from being deposited on the moving element during processing.

In certain example embodiments, the apparatus comprises:

a heater inside of the outer chamber but on the outside of the reactionchamber.

In certain example embodiments, the apparatus comprises inactive gasin-feed into the outer chamber into an intermediate space formed inbetween the reaction chamber and outer chamber walls and outlet of theinactive gas from the intermediate space. The intermediate space hereinis the volume within the outer chamber that surrounds the reactionchamber. The outer chamber may be formed by a pressure vessel. The outerchamber may be denoted as a vacuum chamber due to vacuum conditionsgenerated therein. In certain example embodiments, both the reactionchamber and outer chamber are in vacuum when loading the substrates (andduring processing, i.e., deposition and/or cleaning). In certain exampleembodiments, the outer chamber and the reaction chamber contain separatewalls, i.e., they do not have common walls, but the outer chamber trulyaccommodates the reaction chamber (being separated by the intermediatespace).

In certain example embodiments, an inner surface of the moving elementfaces an exhaust line pressure. In certain example embodiment, an outersurface of the moving element faces a pressure that is higher than thepressure within the exhaust line. The higher pressure may be a pressurewithin the intermediate space, or an ambient pressure in someembodiments.

In certain example embodiments, the direction of gas flow within thereaction chamber is from top to bottom. The gas or fluid in-feed intothe reaction chamber is preferably from the top side of the reactionchamber and the outlet from a lower part of the reaction chamber (belowthe substrate), for example, through the bottom or bottom part of thereaction chamber into an exhaust line.

In certain other embodiments, the direction of gas flow within thereaction chamber is completely or partially from side to side, over ahorizontally oriented substrate. The gas or fluid in-feed into thereaction chamber in this embodiment is arranged from a side oroff-center of the substrate.

In certain example embodiments, the movable reaction chamber encloses areaction space (in which the desired deposition or cleaning reactionsare intended to occur).

In certain example embodiments, the apparatus is an atomic layerdeposition, ALD, apparatus. In this context, the term ALD comprises ALDsub-types, such as MLD (Molecular Layer Deposition), plasma-assistedALD, for example PEALD (Plasma Enhanced Atomic Layer Deposition), andphoto-enhanced Atomic Layer Deposition (known also as flash enhancedALD). In alternative embodiments, the apparatus is a chemical vapordeposition, CVD, apparatus. In alternative embodiments, the apparatus isa plasma-assisted cleaning apparatus.

In certain example embodiments, the apparatus comprises a deformablepart above the substrate(s), as in U.S. Pat. No. 9,095,869 B2, enablinglisting of a reaction chamber in-feed part. The deformable part may beimplemented by a bellows or by interlacing tubes as deformablecomponents.

In certain example embodiments, the pressure within both the reactionchamber and outer chamber (if any) is below ambient or atmosphericpressure, the apparatus therefore being configured to process substratesin such a reduced pressure.

According to a second example aspect of the present disclosure there isprovided a method, comprising:

providing a reaction chamber of a deposition or cleaning reactor with aprocessing position and a lowered position; and

moving the reaction chamber between the processing position and thelowered position, the lowered position being for loading one or moresubstrates into the reaction chamber.

In certain example embodiments, the method comprises:

forming a loading opening into the reaction chamber by downward movementof the reaction chamber.

In certain example embodiments, the reaction chamber comprises or isformed of a reaction chamber body or a reaction vessel. In certainexample embodiments, the method comprises moving the reaction chamberbody or reaction vessel as a whole.

In certain example embodiments, the method comprises:

detaching the reaction chamber from an upper stationary part upondownward movement of the reaction chamber.

In certain example embodiments, the method comprises:

loading the one or more substrates into the reaction chamber through aside of an outer chamber surrounding the reaction chamber.

In certain example embodiments, the method comprises:

moving the reaction chamber by a gastight flexure element, such as avacuum bellows.

In certain example embodiments, the method comprises:

moving the reaction chamber by an element positioned into an exhaustline of the deposition or cleaning reactor.

In certain example embodiments, the method comprises providing anintermediate space formed in between the reaction chamber and outerchamber walls with a greater pressure compared to reaction chamberpressure.

In certain example embodiments, the method is implemented in adeposition or cleaning reactor having an outer chamber and a reactionchamber inside the outer chamber.

In certain example embodiments, the method comprises practicing anatomic layer deposition, ALD, method on the one or more substrateswithin the reaction chamber. In certain alternative embodiments, themethod comprises practicing a chemical vapor deposition, CVD, method onthe one or more substrates within the reaction chamber. In certainexample embodiments, the method comprises practicing a cleaning process,such as a plasma-assisted cleaning process, within the reaction chamber.

According to a third example aspect of the present disclosure there isprovided a deposition or cleaning reactor (substrate processing reactoror apparatus) comprising means for implementing the method of the secondaspect or any of the embodiments of the second aspect.

Different non-binding example aspects and embodiments of the presentinvention have been illustrated in the foregoing. The above embodimentsare used merely to explain selected aspects or steps that may beutilized in implementations of the present invention. Some embodimentsmay be presented only with reference to certain example aspects of theinvention. It should be appreciated that corresponding embodiments applyto other example aspects as well. Any appropriate combinations of theembodiments may be formed.

BRIEF DESCRIPTION OF THE DRAWINGS

The aspects of the disclosed embodiments will now be described, by wayof example only, with reference to the accompanying drawings, in which:

FIG. 1 shows a schematic side view of an apparatus in a loading stageaccording to an embodiment of the present disclosure;

FIG. 2 shows a schematic side view of the apparatus disclosed in FIG. 1in a processing stage according to an embodiment of the presentdisclosure;

FIG. 3 shows a schematic side view of an apparatus according to analternative embodiment of the present disclosure;

FIG. 4 shows a schematic side view of an apparatus according to yetanother embodiment of the present disclosure;

FIG. 5 shows certain details in an apparatus according to an embodimentof the present disclosure;

FIG. 6 shows a schematic side view of an apparatus according to anotheralternative embodiment of the present disclosure;

FIG. 7 shows a schematic side view of an apparatus according to yetanother alternative embodiment of the present disclosure; and

FIG. 8 shows a method according to an embodiment of the presentdisclosure.

DETAILED DESCRIPTION

In the following description, Atomic Layer Deposition (ALD) technologyis used as an example. However, the invention is not limited to ALDtechnology, but it can be exploited in a wide variety of depositionapparatuses, for example, in Chemical Vapor Deposition (CVD) reactors aswell as in cleaning reactors.

The basics of an ALD growth mechanism are known to a skilled person. ALDis a special chemical deposition method based on the sequentialintroduction of at least two reactive precursor species to at least onesubstrate. It is to be understood, however, that one of these reactiveprecursors can be substituted by energy when using photo-enhanced ALD orplasma-assisted ALD, for example PEALD, leading to single precursor ALDprocesses. Thin films grown by ALD are dense, pinhole free and haveuniform thickness.

The at least one substrate is typically exposed to temporally separatedprecursor pulses in a reaction vessel to deposit material on thesubstrate surfaces by sequential self-saturating surface reactions. Inthe context of this application, the term ALD comprises all applicableALD based techniques and any equivalent or closely related technologies,such as, for example the following ALD sub-types: MLD (Molecular LayerDeposition) plasma-assisted ALD, for example PEALD (Plasma EnhancedAtomic Layer Deposition) and photo-enhanced Atomic Layer Deposition(known also as flash enhanced ALD).

A basic ALD deposition cycle consists of four sequential steps: pulse A,purge A, pulse B and purge B. Pulse A consists of a first precursorvapor and pulse B of another precursor vapor. Inactive gas and a vacuumpump are typically used for purging gaseous reaction by-products and theresidual reactant molecules from the reaction space during purge A andpurge B. A deposition sequence comprises at least one deposition cycle.Deposition cycles are repeated until the deposition sequence hasproduced a thin film or coating of desired thickness. Deposition cyclescan also be either simpler or more complex. For example, the cycles caninclude three or more reactant vapor pulses separated by purging steps,or certain purge steps can be omitted. All these deposition cycles forma timed deposition sequence that is controlled by a logic unit or amicroprocessor.

FIGS. 1 and 2 show schematic side views of a deposition or cleaningapparatus according to an example embodiment. The apparatus comprises anouter chamber wall defining an outer chamber 110. The apparatus furthercomprises a reaction chamber 120 inside the outer chamber 110 thusforming a double chamber structure. The space formed in between theouter chamber wall and the reaction chamber 120 (i.e., the space definedby the outer chamber 110 and surrounding the reaction chamber 120) isdefined as an intermediate space 111 and the space within the reactionchamber 120 as a reaction space 112 as shown in FIG. 2 .

The reaction chamber 120 is configured to move between a deposition orcleaning position (FIG. 2 ) and a lowered position (FIG. 1 ) inside theouter chamber 110. The lowered position is for loading one or moresubstrates 105 into the reaction chamber. The deposition or cleaningposition is for processing the one or more substrates 105 in accordancewith the selected deposition or cleaning method, for example, ALD orCVD.

The apparatus comprises a loading port 115 at the side of the outerchamber 110 for loading the one or more substrates 105 into the reactionchamber 120 through the side of the outer chamber 110. The loading port115 shown depicts a load lock 115, although in alternative embodimentsthe load lock 115 may be omitted and replaced by a simpler structure,such as a hatch or similar. In certain example embodiments, the loadingport 115 may be a gate valve or a load lock against ambient conditionsor against other equipment.

The apparatus comprises a moving element 140 connected to the reactionchamber 120. The moving element 140 allows the reaction chamber 120 tomove vertically between the deposition or cleaning position and thelowered position. The moving element 140 may be a flexure structure. Itmay be a tube-like elongated structure whose length is adjustable. Themoving element 140 may be a deformable component. The moving element 140shown in FIGS. 1 and 2 is a bellows, in particular a vacuum bellows,allowing fluid to pass through in a vertical direction, but havinggastight side walls. The moving element 140 may form part of an exhaustline 150 below the reaction chamber 120 as shown in FIGS. 1 and 2 . Themoving element 140 is positioned in its entirety inside of the outerchamber 110 walls in vacuum.

The actual movement of the reaction chamber 120 may be driven by anactuator (actuating element) or by the moving element 140 itself. Theembodiment in FIGS. 1 and 2 shows an actuator 145 positioned on theoutside of the outer chamber 110. The actuator 145 applies force to thereaction chamber 120 so that the reaction chamber moves as allowed bythe moving element 140. The actuator 145 shown in FIGS. 1 and 2comprises a force transmission member, such as a shaft or rod, whichextends through an outer chamber feedthrough into the intermediate spacebetween the outer chamber 110 and reaction chamber 120. The forcetransmission member further contacts the reaction chamber 120 enablingmovement of the reaction chamber 120 as allowed by the moving element140. The moving element 140 has a contracted shape as shown in FIG. 1and an extended shape as shown in FIG. 2 , and it allows verticalmovement of the reaction chamber 120 between positions defined by theseshapes.

In other embodiments, the placement, form and operation of the actuatingelement may deviate from the ones shown in FIGS. 1 and 2 . The placementof the actuating element depends on the implementation. In certainexample embodiments, the actuating element is positioned on the outsideof the outer chamber. In certain example embodiments, the actuatingelement is positioned within the outer chamber, but on the outside ofthe reaction chamber. In certain example embodiments, the actuatingelement is positioned within the exhaust line 150. Depending on theimplementation the deposition or cleaning apparatus can comprise aplurality of actuating elements.

In certain example embodiment, the actuating element is omittedaltogether. In one such an embodiment, the moving element 140 as suchmoves the reaction chamber without an external actuator (external heremeaning external to the moving element). The moving may be implementeddue to radiation or changes in temperature, for example. FIG. 3 showsone such alternative embodiment in which the moving element 140 isformed of shape-memory alloy (smart metal). In such an embodiment, themoving element 140 in practice is a kind of actuator in itself whichmoves the reaction chamber 120 between vertical positions.

The apparatus is configured to form a loading opening into the reactionchamber 120 by downward movement of the reaction chamber 120.Accordingly, in certain example embodiments, the reaction chamber 120 isconfigured to detach from an upper stationary part upon downwardmovement of the reaction chamber 120 to open a route for loading. Incertain example embodiments, the upper stationary part is a partproviding fluid in-feed into the reaction chamber 120.

The part on top of the movable reaction chamber (i.e., upper stationarypart of the apparatus) may be an open or closed part.

The embodiment shown in FIGS. 1 and 2 shows a radical in-feed tube 160extending from a radical source (not shown). The radical in-feed tuberemains stationary when the reaction chamber 120 is lowered. The loadingopening forms in between the reaction chamber 120 sidewall and theradical in-feed tube 160 (FIG. 1 ).

The embodiment shown in FIGS. 1 and 2 further shows an in-feed line 125which may be an in-feed line for inactive gas, or for a precursor ofthermal ALD, for example. The in-feed line 125 extends from a source(not shown) via an outer chamber feedthrough into the intermediatespace. It further extends into an outlet in a fixed flange or collar 161on top of the movable reaction chamber 120 (so as to provide entry ofinactive/precursor gas or fluid into the reaction chamber 120 at thatpoint). The part 161 remains stationary when the reaction chamber 120 islowered. Depending on the implementation the deposition or cleaningreactor can comprise a plurality of in-feed lines 125. In otherembodiments, for example in certain cleaning embodiments, they can beomitted.

The alternative embodiment shown in FIG. 4 shows an example of a closedupper stationary part. It may be, for example, a lid-like part 470optionally comprising an expansion volume 475 for downward fluiddistribution.

The apparatus comprises a substrate holder 130 which is configured toreceive the one or more substrates 105 loaded through the loading port115. In certain example embodiments, the substrate holder 130 isattached to the exhaust line 150. In certain other example embodiments,such as the one shown in FIG. 4 , a substrate holder 430 is integratableor integrated to reaction chamber top part of lid 470. The substrateholder may be movable within the reaction chamber 120, for example,vertically.

The apparatus described herein also comprises a heater 155 within theouter chamber 110 but on the outside of the reaction chamber 120,although in some embodiments the heater may be omitted.

In certain example embodiments, the apparatus comprises inactive gasin-feed into the outer chamber 110 into the intermediate space formed inbetween the reaction chamber 120 and outer chamber 110 walls and outletof the inactive gas from the intermediate space (the intermediate spaceherein being the volume within the outer chamber that surrounds thereaction chamber). FIG. 5 shows one such an embodiment. Inactive gas isfed in via an outer chamber feedthrough 581 and pumped out to theexhaust line 150 via feedthrough 582. The outlet can be upstream ordownstream in relation to the moving part 140. In an alternativeembodiment, the outlet is to a separate pump line. In a yet alternativeembodiment, the outlet is into the reaction chamber 120 at the pointwhere the moving reaction chamber 120 contacts the upper stationarypart. The contact formed between the movable reaction chamber 120 andthe stationary part when the reaction chamber 120 is in the depositionor cleaning position may be a metal-metal contact.

In certain example embodiments, the direction of gas flow within thereaction chamber 120 is from top to bottom. The gas or fluid in-feedinto the reaction chamber 120 is preferably from the top side of thereaction chamber 120 and the outlet from a lower part of the reactionchamber (below the substrate), for example, through the bottom or bottompart of the reaction chamber 120 into the exhaust line 150. In the endof the exhaust line 150 is a vacuum pump (not shown) which pumps theinterior of the reaction chamber 120 into vacuum.

In certain example embodiments, the reaction chamber 120 forms a bodywith rotational symmetry. The reaction chamber 120 may be a bowl-likepart (having an exhaust opening in its bottom). The outer chamber 110may be formed by a pressure vessel. The outer chamber 110 may be denotedas a vacuum chamber due to vacuum conditions generated therein. Incertain example embodiments, both the reaction chamber 120 and outerchamber 110 are in vacuum when loading the substrates (and duringprocessing). The outer chamber 110 walls form a borderline. The volumewithin the vacuum chamber walls, which especially applies to theinterior of the reaction chamber 120, is pumped into vacuum by a vacuumpump (not shown) vacuum conditions thereby prevailing within the volumedefined by the vacuum chamber walls.

In certain example embodiments, the pressure in the intermediate space111 during processing is below atmospheric pressure. In certain exampleembodiments the pressure in the intermediate space is 0.9 bar or less,preferably 15−5 mbar the pressure in the reaction space 112 thenpreferably being 1.5−0.1 mbar. The pressure in the intermediate space111 is preferably at least two times the pressure in the reaction space112. In some embodiments, the pressure in the intermediate space 111 is5 to 10 times the pressure in the reaction space 112. In some otherembodiments, such as when using microwave plasma, the pressure in thereaction space 112 may be 1 Pa and the pressure in the intermediatespace 4 −5 Pa. A turbomolecular pump may be applied to obtain highdegrees of vacuum.

When the reaction chamber 120 is opened (lowered) for unloading thepressure of the reaction chamber 120 in an embodiment is raised to areading that is the same of higher compared to the pressure in theintermediate space 111 so as to push possible particles away from thesubstrate.

In certain example embodiments, an alternative moving element is used.The moving element 640 shown in FIG. 6 is implemented by two (or more)interlaced or nested tubes which are vertically movable in relation toeach other. The embodiment otherwise contains similar elements andoperates similarly as the embodiments described in the preceding.

FIG. 7 shows an optional protective element 791 which is placed withinthe exhaust line 150 and which is configured to prevent material frombeing deposited on the moving element 140 during processing. Theprotective element 791 may be in the form of a tube and it may extendalong the whole length of the moving element 140, and even further. Itmay be fixed to the exhaust line 150 or to an edge of the outer chamber110. Inactive gas is in an embodiment fed from the intermediate space111 into the space formed in between the protective element 791 and themoving element 140 via feedthrough 582 close to a dead lower end of thespace. The inactive gas flows upwards along the formed tight space tothe point in which the protective element 791 ends. The flow turns thereinto the downward direction and mixes with exhaust line flow. The entryof reactive gases into the space in between the protective element 791and the moving element 140 is thereby hindered. In embodiments where thesubstrate holder 130 is omitted the substrate(s) may be supported by anupper edge of the protective element 791.

In yet another embodiment, there is a second moving element (anothertubular element such as a second bellows) around the disclosed (first)moving element 140. A closed space is formed in between the two movingelements and the formed space is pressurized with gas or fluid asrequired to obtain deformations in the moving elements due to changes inapplied pressure thereby causing vertical movement of the reactionchamber 120 as desired. Said second moving element may be for exampletightly fitted against the outer wall of the reaction chamber 120 at itsone end and against the outer chamber 110 wall at its other end. Thearrangement operates as a pneumatic actuator.

In yet another embodiment, the outer chamber 110 is omitted. Thereaction chamber 120 forms part of a single chamber reactor. A loadingopening is formed by lowering the reaction chamber 120 as a whole.

FIG. 8 shows a method according to an embodiment of the presentdisclosure. In step 801, the reaction chamber is lowered. The one ormore substrates is loading in step 802. The reaction chamber is raisedinto the deposition or cleaning position in step 803 for the depositionand/or cleaning to occur with a selected deposition or cleaning methodin step 804. After processing, the reaction chamber is again lowered instep 805, and the one or more substrates are unloaded in step 806. Inmore general embodiments, one or more of the steps 802-806 may beomitted. In yet another embodiment, for example in a powder coatingembodiment, the powder may be loaded along a separate channel andunloaded along the same or different channel. In such an embodiment, thelowering of the reaction chamber for loading will not be needed, but thelowering of the reaction chamber may be used for a maintenance purposeonly.

The description concerning any particular preceding embodiment isdirectly applicable to other disclosed embodiments. This applies bothwith regard to the structure and operation of the disclosed apparatus.

Without limiting the scope and interpretation of the patent claims,certain technical effects of one or more of the example embodimentsdisclosed herein are listed in the following. A technical effect isreduced particle formation in a substrate processing apparatus, such asa deposition or cleaning apparatus, above the substrate surface byplacing the moving parts of the reaction chamber below the substrate.Another technical effect is preventing particles from below thesubstrate from entering the space above the substrate, when the flowdirection below the substrate is further away from the substrate (i.e.,downwards). Another technical effect is improved loading method in asubstrate processing reactor, in a double chamber substrate processingreactor in particular. Another technical effect is yet increasedpressure difference, which can be obtained by using flexible bellows adeformable component, compared referred state of are.

It should be noted that some of the functions or method steps discussedin the preceding may be performed in a different order and/orconcurrently with each other. Furthermore, one or more of theabove-described functions or method steps may be optional or may becombined.

The foregoing description has provided by way of non-limiting examplesof particular implementations and embodiments of the present disclosurea full and informative description of the best mode presentlycontemplated by the inventors for carrying out the invention. It ishowever clear to a person skilled in the art that the present disclosureis not restricted to details of the embodiments presented above, butthat it can be implemented in other embodiments using equivalent meanswithout deviating from the characteristics of the present disclosure.

Furthermore, some of the features of the above-disclosed embodiments ofthe present disclosure may be used to advantage without thecorresponding use of other features. As such, the foregoing descriptionshould be considered as merely illustrative of the principles of thepresent disclosure, and not in limitation thereof. Hence, the scope ofthe present disclosure is only restricted by the appended patent claims.

The invention claimed is:
 1. A deposition or cleaning apparatus,comprising: an outer chamber; a reaction chamber inside the outerchamber forming a double chamber structure, a substrate holder; and anexhaust line comprising a bellows connected between the reaction chamberand the outer chamber, the exhaust line configured to allow verticalmovement of the reaction chamber between a processing position and alowered position inside the outer chamber, the lowered position beingfor loading one or more substrates onto the substrate holder at asubstrate loading level, wherein the reaction chamber moves from belowthe substrate loading level at the loading position to above both thesubstrate loading level and the substrate holder at the processingposition, wherein the exhaust line is positioned below the reactionchamber, and wherein a length of the bellows of the exhaust line changeswhen the reaction chamber is moved vertically, and wherein the exhaustline has gastight sidewalls and allows fluid from the reaction chamberto pass through the exhaust line.
 2. The apparatus of claim 1, whereinthe apparatus is configured to form a loading opening into the reactionchamber by downward movement of the reaction chamber.
 3. The apparatusof claim 1, wherein the reaction chamber is configured to detach from anupper stationary part upon downward movement of the reaction chamber toopen a route for loading.
 4. The apparatus of claim 1, comprising: aloading port at the side of the outer chamber for loading the one ormore substrates into the reaction chamber through the side of the outerchamber.
 5. The apparatus of claim 1, wherein the bellows is a vacuumbellows.
 6. The apparatus of claim 1, comprising: a heater inside of theouter chamber but on the outside of the reaction chamber.
 7. Theapparatus of claim 1, comprising an inactive gas fed into the outerchamber into an intermediate space formed in between the reactionchamber and outer chamber walls and evacuated from the intermediatespace.
 8. The apparatus of claim 1, wherein the apparatus is an atomiclayer deposition (ALD) apparatus, or a chemical vapor deposition (CVD)apparatus.
 9. The apparatus of claim 1, wherein the exhaust line allowsfluid from the reaction chamber to pass through the exhaust line in avertical direction.
 10. A deposition or cleaning reactor comprising: areaction chamber inside an outer chamber forming a double chamberstructure, the reaction chamber having a processing position and alowered position; a substrate holder; and wherein the reaction chamberis configured to move vertically between the processing position and thelowered position as allowed by an exhaust line comprising a bellowsconnected between the reaction chamber and the outer chamber, thelowered position being for loading one or more substrates onto thesubstrate holder at a substrate loading level, and the exhaust linebeing positioned below the reaction chamber, wherein the reactionchamber moves from below the substrate loading level at the loadingposition to above both the substrate loading level and above thesubstrate holder at the processing position, wherein a length of thebellows of the exhaust line changes when the reaction chamber is movedvertically, and wherein the exhaust line has gastight sidewalls andallows fluid from the reaction chamber to pass through the exhaust line.